Deposition and characterization of TiAlN/TiAlON/Si3N4 tandem absorbers...

Deposition and characterization of TiAlN/TiAlON/Si3N4 tandem absorbers...

Deposition and characterization of TiAlN/TiAlON/Si3N4 tandem absorbers prepared using reactive direct current magnetron sputtering, H.C. Barshilia, N. Selvakumar, K.S. Rajam, D.V. Sridhara Rao, K. Muraleedharan, Thin Solid Films 516 (2008) 6071-6078,doi: 10.1016/j.tsf.2007.10.113


Last updated on : 12-01-2018 04:13:36pm